INME RAS
Institute of Nanotechnology of Microelectronics of the Russian Academy of Sciences 
Photolithography
- Optical (IR) photolithography processes with a resolution of no less than 0.5 microns
- Electron lithography processes with a resolution of no less than 10 nm.
The process of applying, hard baking and developing photoresists
The process of multi-layer application of photoresist for thick masking layers
