INME RAS
Institute of Nanotechnology of Microelectronics of the Russian Academy of Sciences 
Metal-assisted chemical etching of silicon with different metal films and clusters: A review
01.12.2016
O. Pyatilova, S. Gavrilov, A. Sysa, A. Savitsky, A. Shuliatyev, A. Dudin, A. Pavlov. Metal-assisted chemical etching of silicon with different metal films and clusters: A review //Proceedings of the International Conference «Micro- and Nanoelectronics – 2016» ICMNE – 2016 Book of Abstracts. P. 75.
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