INME RAS
Institute of Nanotechnology of Microelectronics of the Russian Academy of Sciences 
Features of metal-assisted chemical etching of silicon with different metals films and clusters catalysts
01.12.2016
O. Pyatilova, А. Sysa, S. Gavrilov, A. Savitskiy, A. Shuliatyev, A. Dudin, A. Pavlov Features of metal-assisted chemical etching of silicon with different metals films and clusters catalysts //Extended Abstracts of the 10th International Conference PSST 2016 (Porous Semiconductors - Science and Technology) – 2016. – P. 82-83 (02-Р2-11)
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